The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Jan. 11, 1994
Masayuki Togawa, Miyashiro, JP;
Kiyoshi Toyama, Miyashiro, JP;
Teijin Seiki Co., Ltd., Osaka, JP;
Abstract
A method of manufacturing a medium having a magnetic pattern, comprises the steps of forming a first groove in a substrate by photoetching, and forming in the first groove or in a portion of the substrate adjacent to the first groove by the photoetching a second groove of different depth than the first groove. The first and second grooves are then filled with a ferromagnetic substance so that the ferromagnetic substance in the first groove is different in thickness from the ferromagnetic substance in the second groove. The ferromagnetic substance is then magnetized to produce magnetic field intensity distribution based on the thickness of the magnetized ferromagnetic substance.