The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
May. 12, 1993
Tetsuro Hanawa, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A resist pattern having an accurate rectangular sectional configuration and high dimension controllability can be formed using a conventional chemical amplification positive type resist. A chemical amplification positive type resist layer 3 including a base resin, and a protonic acid generating agent decomposed by photochemical reaction to generate protonic acid and a dissolution inhibitor is formed on a semiconductor substrate 2. Light 8 is selectively directed to the chemical amplification positive type resist layer 3 to form an image. The chemical amplification positive type resist layer 3 after irradiation of light 8 has its surface treated with an acid solution 1 so that the surface of the resist layer 3 includes acid. The chemical amplification positive type resist layer 3 treated with acid is baked and then developed to form a resist pattern 7.