The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Jul. 06, 1993
Koichi Osano, Sakai, JP;
Hiroshi Sakakima, Tsuzuki, JP;
Keita Ihara, Katano, JP;
Mitsuo Satomi, Katano, JP;
Kumio Nago, Ikoma, JP;
Youichi Ohnishi, Higashiosaka, JP;
Kunio Tanaka, Toyonaka, JP;
Hitoshi Yamanishi, Higashiosaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
The present invention relates to a method for forming a layer of isotropic soft magnetic nitride alloy even by means of mass-production apparatus wherein a target size is large in comparison to a distance between a substrate and a target, by using a bias sputtering method wherein a negative bias voltage is continuously applied to a substrate and sputtering is carried out in Ar atmosphere mixed with nitrogen gas or periodically mixed with nitrogen gas. Furthermore, the present invention may include a heat treatment of the soft magnetic nitride alloy layer deposited on the substrate in a temperature of more than 300.degree..degree.C. to less than 800.degree. C. to improve a soft magnetic characteristic.