The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Jul. 15, 1994
Applicant:
Inventor:
Ronald J DeNuccio, Greensboro, NC (US);
Assignee:
Hilemn Laboratories, Inc., Greensboro, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
106105 ; 106-111 ; 106-123 ;
Abstract
The harmful effects exhibited by excess silica (Si.sub.2 O) in electroless metal deposition solutions can be controlled by the use of certain amines. The amines can be prepared in separate solutions or can be incorporated into usual plating solutions to effectively control the effects of excess silica present. The amines can be shown to prevent voiding on glass substrates during silver deposition which often occurs with excess silica of amounts over 0.5 ppm.