The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1995
Filed:
Sep. 02, 1993
Applicant:
Inventors:
David Schrader, Midland, MI (US);
Mark E Soderquist, Midland, MI (US);
Mark D Heires, Midland, MI (US);
Assignee:
The Dow Chemical Company, Midland, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
525 71 ; 525316 ; 525315 ; 525314 ; 525 83 ;
Abstract
High impact polystyrene resins are provided having a surprisingly good combination of toughness and gloss characteristics. Such resins contain small (i.e., 0.1 to 0.4 micron) capsule morphology rubber particles in combination with relatively small (i.e., 0.25 to 1 micron) entanglement morphology rubber particles. It has been found that such resins are capable of providing Izod impact strength values in the range of 2.5 to 3.5 ft-lb/in (133.4 to 186.7 J/m) and higher at an overall volume average rubber size of less than 0.4 micron with corresponding gloss values in excess of 90 percent.