The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1995
Filed:
Sep. 29, 1994
Tamaki Iida, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Proposed is an improvement in the process for forming a superhard carbonaceous coating film on various articles by the plasma-induced CVD method using an apparatus in which microwaves generated in an oscillator are introduced into the CVD chamber through a waveguide duct partitioned from the CVD chamber by a gas shield. In the apparatus used according to the invention, a microwave-barrier diaphragm having an orifice of a limited open area is provided between the gas shield in the waveguide duct and the CVD chamber to form a plasma-generating zone between the gas shield and the microwave-barrier diaphragm so that the intensity of the microwaves directly entering the CVD chamber is so limited that the carbonaceous coating film deposited on the substrate surface can be imparted with greatly increased luster and clarity along with an advantage that the substrate article is subjected to less thermal damage by virtue of the decreased temperature elevation by virtue of the limited intensity of the microwaves reaching the substrate.