The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1995
Filed:
Oct. 22, 1990
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A thin film deposition system includes a vacuum or evacuated casing in which there is introduced an active gas or an inert gas or a mixture thereof. A filament emits thermions which impinge upon gas molecules to ionize them into positive ions. The ions bombard a target, from which particles are emitted toward a substrate. The particles emitted from the target are also ionized by the thermions. In the vicinity of a grid, more particles from the target are ionized by thermions which are vertically oscillated and ionized molecules of the gas. The ions are accelerated toward the substrate and bombard the substrate, thereby depositing a thin film thereon. The thin film deposition system may additionally have an evaporation source for supporting an evaporant which emit particles to be deposited on the substrate.