The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1995
Filed:
Jul. 11, 1991
Klaus Hartig, Ronneburg, DE;
Joachim Szczyrbowski, Goldbach, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
An apparatus for the reactive coating of a substrate 1, with silicon dioxide (SiO.sub.2) for example, comprises a power source 10, 37 connected to an electrode 5 which is disposed in an evacuable coating chamber 15, 15a and interacts with a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1, wherein argon and oxygen, for example, are supplied to the coating chamber 15, 15a. The target to be sputtered is composed of several parts, for example. A center part 3a of the target 3 opposite the substrate 1 is made of silicon (Si) and the part 3b surrounding this center portion is made of zinc (Sn), for example. Provision is made for a diaphragm 24 between the substrate 1 on the one hand, and the target 3, on the other hand. The shape of the magnetic field of the electrode 5 during the sputtering generates a sputtering of the more reactive target material 3a in the oxidic mode and of the less reactive target material 3b in the metallic mode.