The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1995
Filed:
Mar. 23, 1994
David M Pultorak, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method and apparatus for establishing optimum film exposure time for documents of different reflectances, A photo-sensor is used to produce a signal proportional to the intensity of light reflected from the document to be microfilmed, The signal is integrated and a time is determined for the integrated signal to reach a threshold or reference value, The time needed to reach the threshold value is measured very accurately by a microprocessor, The measured time is then convened to new time by using a look-up table, The new or desired shutter time is controlled by the microprocessor by terminating the exposure when the total time the shutter was open equals new exposure time found in this look-up table.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile