The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1995
Filed:
Feb. 01, 1994
Frank J Sweeney, Rowlett, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of fabricating a resistor which comprises the steps of providing a semiconductor substrate, preferably silicon, forming a layer of oxide over the substrate, providing on the layer of oxide a region of material having a substantially higher resistance in the undoped state than in the doped state, preferably polysilicon, patterning a region over the material to expose predetermined regions of the material, doping the exposed regions of the material to a predetermined doping level substantially greater than the doping level of the original material, masking the doped regions and a portion of the previously unexposed regions of the material on spaced apart portions of the doped regions and etching away the exposed region of material external to the doped regions and external to the portion of the previously unexposed regions of the material on spaced apart portions of the doped regions.