The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1995
Filed:
Oct. 05, 1994
Applicant:
Inventors:
Fumiyo Narui, Kanagawa, JP;
Masafumi Ozawa, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44L / ;
U.S. Cl.
CPC ...
1566431 ; 437232 ; 437234 ;
Abstract
When a ZnSe, ZnTe or ZnSSe or Zn.sub.1-a Mg.sub.a S.sub.b Se.sub.1-b (0<a<1, 0<b<1) layer provided on a Zn.sub.1-x Mg.sub.x S.sub.y Se.sub.1-y (0<x<1, 0<y<1, a<x) layer is selectively etched by a dry etching method such as an RIE method, the Zn.sub.1-x Mg.sub.x S.sub.y Se.sub.1-y layer is used as an etching stoppig layer. Thus, selective etching of the ZnSe, ZnTe, ZnSSe or Zn.sub.1-a Mg.sub.a S.sub.b Se.sub.1-b layer can be conducted with excellent controllability and reproducibility.