The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1995
Filed:
Dec. 19, 1991
John Marshall, Farnborough, GB;
David F Muller, Boston, MA (US);
Summit Technology, Inc., Waltham, MA (US);
Abstract
A method and system for reshaping Bowman's membrane, which lies directly below the anterior epithelial surface of the cornea, to provide correction of refractive errors in the eye by photoablation of selective regions of the Bowman's membrane without substantial penetration into the stroma of the eye is disclosed including a laser and a beam-shaping mask, disposed between the laser and the surface of the cornea, which imposes a defined ablation profile upon the Bowman's membrane by laser radiation. The system can also include a feedback control for measuring the effectiveness of the laser during operation and for controlling the laser such that the reprofiling operation is substantially confined to the Bowman's membrane throughout the procedure. The beam-shaping mask can include either an aperture e.g., a beam-shaping stop means alone or in combination with a beam-shaping window, or an mask which is erodible or otherwise graded in its absorptive capacity to present a predefined profile of resistance to the laser radiation.