The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1995
Filed:
Sep. 29, 1993
Ken Kawada, Kanagawa, JP;
Takatoshi Ishikawa, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A photosensitive material processing apparatus having a processing tank in which a processing solution for processing a photosensitive material is stored, and rollers or the like for conveying the photosensitive material along a predetermined path within the processing tank. By maintaining a humidity of upper portion spaces of the processing tank at greater than or equal to 80%RH, dirtying of machinery due to crystal deposition of processing chemicals and non-uniformity of the processing solution are prevented. In order to maintain the humidity of the upper portion spaces of the processing tank at greater than or equal to 80%RH, a cover having an opening ratio of less than or equal to 40% is disposed at an upper portion of the processing tank, and spaces enclosed by the cover are not ventilated by fans. Further, it is preferable that a ratio of a volume of the upper portion spaces of the processing tank enclosed by a cover to an area of an exposed surface of the solution within the processing tank is 0.5 cm.sup.3 /cm.sup.2 to 10 cm.sup.3 /cm.sup.2.