The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1995
Filed:
Apr. 27, 1992
Applicant:
Inventor:
John M Pierce, Palo Alto, CA (US);
Assignee:
National Semiconductor Corporation, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 32 ; 437 40 ; 437 41 ;
Abstract
A method is disclosed for forming MOSFET devices on a semiconductor substrate including steps of depositing layers of polysilicon, dielectric, and polysilicon again. Each polysilicon layer is planarized after it is deposited. The dielectric layer is patterned and etched to delineate active regions and interconnect grooves. After the second polysilicon layer is planarized, the material in the active region is patterned and etched to form a gate and source and drain areas. The appropriate areas of the active region are doped as necessary to form the source and drain.