The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1995
Filed:
Oct. 29, 1992
Akio Maruyama, Tokyo, JP;
Toshiro Kikuchi, Yokohama, JP;
Shoji Amamiya, Kawasaki, JP;
Shin Nagahara, Tokyo, JP;
Katsumi Aoki, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A electrophotographic photosensitive member and an electrophotographic apparatus, a device unit and a facsimile machine using an electrophotographic photosensitive member which comprises a conductive support, a photosensitive layer and a protective layer, the protective layer containing resin formed by hardening a light-setting type acrylic monomer, and the photosensitive layer containing at least one compound selected from the group consisting of (A), (B) and (C) below: (A) styryl compounds having a structure expressed by the following formula (1) and a melting point not higher than 135.degree. C.; ##STR1## wherein Ar.sup.1 and Ar.sup.2 are aromatic ring groups, Ar.sup.3 is a bivalent aromatic ring group or a bivalent heterocyclic group, R.sup.1 is an alkyl group or an aromatic ring group, R.sup.2 is a hydrogen atom, an alkyl group or an aromatic ring group, and n.sub.1 is 1 or 2, R.sup.1 and R.sup.2 possibly linking to form a ring when n.sub.1 =1; (B) triarylamine compounds having a structure expressed by the following formula (2) and a melting point not higher than 150.degree. C.; ##STR2## wherein Ar.sup.4, Ar.sup.5 and Ar.sup.6 are each an aromatic ring group or a heterocyclic group: (C) hydrazone compounds having a structure expressed by the following formula (3) and a melting point not higher than 155.degree. C.; ##STR3## wherein R.sup.3 is a hydrogen atom or an alkyl group, R.sup.4 and R.sup.5 are alkyl groups, aralkyl groups or aromatic ring groups, n.sub.2 is 1 or 2, A is an aromatic ring group, a heterocyclic group or --CH.dbd.C(R.sup.6)R.sup.7 (R.sup.6 and R.sup.7 are hydrogen atoms, aromatic ring groups or heterocyclic groups, but will never be hydrogen atoms at the same time). The photosensitive member suppresses the occurrence of cracks during forming of the protective layer, has high durability, and is free from any image defects.