The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1995
Filed:
Apr. 28, 1994
Applicant:
Inventors:
Masaharu Satoh, Tokyo, JP;
Hitoshi Ishikawa, Tokyo, JP;
Kosuke Amano, Tokyo, JP;
Setsuo Kaneko, Tokyo, JP;
Yoshihiro Hirai, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
428704 ; 528422 ; 252500 ; 252512 ; 252518 ; 428-1 ;
Abstract
A light-resistant polyaniline light-shielding film, comprising a thin polyaniline film in which Lewis acid is contained in an amount of 0.1 to 5 mol % per monomer unit of the polyaniline. The thin film is used as a black matrix for a liquid crystal display device. The device thus obtained has high reliability.
Satoh, Masaharu. (1995). Light-resistant polyaniline light-shielding film and liquid crystal (U.S. Patent No. 5422194). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5422194
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile