The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 1995
Filed:
Mar. 18, 1994
Masao Nakajima, Yokohama, JP;
Masayoshi Naito, Sendai, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus for exposing a peripheral portion of a substrate to light comprises a rotating member for rotating a substrate to which a resist is applied, an irradiating system for irradiating the substrate with light which is sensed by the resist, a position detecting system for detecting a relative position between the light and the substrate in a radial direction of the substrate, a moving system for making a relative movement between the light and the substrate in the radial direction of the substrate, a periphery detecting member for detecting outer-periphery information corresponding to a shape of an outer periphery of the substrate, a control system for servo-controlling the moving system in accordance with the outer periphery of the substrate to make the width of the light emitted on the substrate constant, a characteristic detecting member for detecting a specific part of the peripheral portion of the substrate, and a control characteristic changing member for changing a control quantity of the control system at the specific part of the peripheral portion of the substrate.