The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 1995

Filed:

Mar. 05, 1993
Applicant:
Inventor:

Jan M Maarschalkerweerd, Mount Brydges, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
250431 ; 250436 ; 250438 ;
Abstract

A fluid treatment system and process includes structure and steps relating to a gravity fed fluid treatment system. A fluid inlet and a fluid outlet are provided, and an irradiation zone is disposed between the fluid inlet and the fluid outlet. The irradiation zone includes at least one radiation source and has a closed cross-section to confine fluid to be treated within a predefined maximum distance from the at least one radiation source. Cleaning structure is provided to remove undesired materials from an exterior of the radiation source. The cleaning structure comprises a cleaning sleeve surrounding the radiation source and movable with respect thereto. The cleaning solution includes a chamber surrounding and in contact with the exterior of the radiation source, the chamber being supplied with a cleaning solution suitable to remove undesired materials from the exterior of the radiation source.


Find Patent Forward Citations

Loading…