The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1995
Filed:
Sep. 19, 1984
James Y Koo, Strasburg, PA (US);
Kerr Group, Inc., Lancaster, PA (US);
Abstract
A closure including an improved hinge includes a cap member selectively coupleable to a container to cover an opening in the container. The cap member includes a first substantially planar member, a depending skirt and an aperture formed through the first substantially planar member. A solid member integrally formed with the cap member projects out of the first substantially planar member. The solid member includes an upper surface and two opposed side surfaces, with each of the opposed side surfaces having an indentation formed therein. The closure further includes a flip top having a plug wherein, when the flip top is in a closed position, the plug seals the aperture formed in the first substantially planar member and the flip top covers substantially all of the first planar member, wherein the flip top includes a cut-out area to accommodate the solid member so that, when the flip top is in the closed position, the flip top and the upper surface of the solid member form a substantially continuous surface. The flip top also includes two projections on opposed sides of the cut-out area, each projection being received in a corresponding indentation in the solid member to couple the flip top to the solid member so that it may be rotated between the closed position and an open position in which the plug is removed from the aperture.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile