The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 1995
Filed:
Jan. 10, 1994
Paul K Liu, O'Hara Township, Allegheny County, PA (US);
Jeffrey C Wu, O'Hara Township, Allegheny County, PA (US);
Media and Process Technology Inc., Pittsburgh, PA (US);
Abstract
A novel membrane preparation process via chemical vapor deposition (CVD) deposits a film on a microporous ceramic support at a low temperature (300.degree. to 550.degree. C.) with organic metallic compounds as precursors and then converts the film into porous oxide at a higher temperature (350.degree. C. to 800.degree. C., preferably 450.degree. C. to 600.degree. C.) to increase its permeability and stability at a given process application temperature. The novel membrane is used for gas separations at an elevated temperature (300.degree. C. to 800.degree. C.). The novel membrane can be used as a catalytic membrane reactor which selectively removes one of the reaction products, thereby enhancing the conversion of the reaction. The ultrafiltration membrane provides gaseous mixtures separation media having high permeance and superior hydrogen selectivity.