The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 1995
Filed:
Dec. 23, 1993
Toshio Kurokawa, Kanagawa, JP;
Mitsuru Sawano, Shizuoka, JP;
Yukio Osawa, Kanagawa, JP;
Kenichi Nakagawa, Shizuoka, JP;
Mitsuyoshi Ichihashi, Shizuoka, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
To provide a photosensitive material exposure apparatus which is easy for soft focusing exposure. A liquid crystal light regulation member 72 capable of holding light transmission and scattering functions reversibly is disposed between a light source 54 and paper 12. Original image light from a negative film 10 is made to pass through the liquid crystal light regulation member 72, so that the paper 12 is exposed to the light which has passed through the liquid crystal light regulation member 72. The relation of haze (%) with the ratio B/A of the distance B between the liquid crystal light regulation member 72 and the paper 12 to the distance A between the negative film 10 and the paper 12 is represented by B/A<0.3-0.0025 H, preferably, B/A<0.3-0.0029 H. The light transmission and scattering functions can be held wholly or partly or for every pixel by controlling current conduction to electrodes, so that the liquid crystal light regulation member 72 can be made to serve as a soft focusing filter. A photosensitive material can be subjected to soft focusing exposure easily by electric controlling without mechanical motion.