The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 1995

Filed:

Jun. 05, 1992
Applicant:
Inventors:

Tadahiro Ohmi, Aoba-ku, Sendai-city, Miyagi-prefecture, JP;

Yoshio Ishihara, Tsuchiura, JP;

Ryosuke Fukushima, Kyoto, JP;

Assignees:

Horiba, Ltd., Kyoto, JP;

Nippon Sanso Corporation, Tokyo, JP;

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ;
U.S. Cl.
CPC ...
324439 ; 73 2902 ; 436 55 ; 324 711 ;
Abstract

A method capable of accurately and inexpensively measuring a very small quantity of impurities, such as water, contained in chemical substances, which are gaseous at normal temperature and pressure, is provided. A concentration of a very small quantity of impurities, contained in the chemical substances, which are gaseous at normal temperature and pressure, is measured by introducing the chemical substances into a cell under the condition of liquefied gases to measure an electric conductivity of the liquefied gases.


Find Patent Forward Citations

Ohmi, Tadahiro. (1995). Method of measuring very small quantity of impurity in gas (U.S. Patent No. 5414361). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5414361

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…