The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 1995

Filed:

Oct. 14, 1993
Applicant:
Inventor:

Tai-Sheng Chou, Pennington, NJ (US);

Assignee:

Mobil Oil Corporation, Fairfax, VA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C10G / ;
U.S. Cl.
CPC ...
208113 ; 4232391 ; 4232392 ;
Abstract

A process for reducing NOx emissions and an FCC process using same as a flue gas cleanup stage are disclosed. Gas containing NOx and entrained catalyst fines is passed up through a bed of catalyst at a sufficient velocity to expand and fluidize the catalyst bed. Particulates deposited on the catalyst are abraided or elutriated away by fluidization, preventing fouling of the DeNOx catalyst. A low pressure drop design, with vertical, perforate gas distributors covered by the bed is also disclosed.


Find Patent Forward Citations

Chou, Tai-Sheng. (1995). Fcc process with fines tolerant scr reactor (U.S. Patent No. 5413699). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5413699

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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