The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 1995
Filed:
Jul. 07, 1993
Hiroyuki Suzuki, Tokyo, JP;
Osamu Furukawa, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A projection exposure method and apparatus are disclosed, which can perform a focusing operation with respect to a partly omitted shot exposed at a peripheral portion of a photosensitive substrate such as a wafer. In the projection exposure method and apparatus, when a prohibition band having a predetermined width is set from the edge of the substrate, and exposure is to be performed with respect to a shot area having a portion located only within the prohibition band and the remaining portion located outside the edge of the substrate, a focus detection point is shifted to the boundary line of the prohibition band on the substrate, and a focusing operation is performed. Thereafter, the focus detection point is moved to an original target shot exposure position to perform exposure.