The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 1995
Filed:
Aug. 23, 1993
Henry J Lee, Summerville, SC (US);
Asten Group, Inc., Charleston, SC (US);
Abstract
A flat woven pin-seamed papermakers fabric wherein machine direction yarns define a series of seaming loops on the opposing fabric ends. The fabric comprises a system of flat monofilament machine direction warp yarns (hereinafter MD yarns) which are woven in a selected weave construction. In a preferred embodiment, the system of MD yarns comprises upper and lower yarns which are vertically stacked. Selected end segments of the upper and lower MD yarns are removed and yarn segments made of a more durable material are rewoven into the fabric end in the space vacated by the trimmed upper and lower MD yarn end segments. Non-loop forming upper MD yarns are preferably backwoven into the space vacated by trimming respective lower MD yarns. Preferably, at least the upper MD yarns are woven contiguous with each other to lock in the machine direction alignment of the stacking pairs of MD yarns and the orthogonal orientation of the end loops. The seaming loops of the opposing ends are intermeshed and joined via a pintle yarn. The permeability of the seam area is controlled via the inserting of rectangular stuffer yarns parallel to the pintle yarn.