The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 1995

Filed:

May. 27, 1993
Applicant:
Inventors:

Gerrit H Van Yperen, Eindhoven, NL;

Peter Van Der Meulen, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V / ;
U.S. Cl.
CPC ...
324309 ; 324307 ;
Abstract

In a magnetic resonance imaging method multiple refocusing RF-pulses (22-26) are applied and spin-echo signals (62-66) obtained following an excitation RF-pulse (21). Imperfections in the applied RF-pulses (21-26) and the switched gradient magnetic fields (31-36, 42-46, 51-56) cause deviations from the desired phases of the nuclear dipole moments which appear as artefacts or ghosts in a resulting image. By a suitable arrangement of the application of the phase encoding values (242-248; 342-348) imposed during the measurements and/or the addition of supplemental measurements, the effects of the phase deviations in an image are significantly reduced, resulting in images in which less artefacts and ghosts are visible. Reduction of artefacts is also obtained by weighting of measured NMR-signals.


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