The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 1995
Filed:
Jul. 15, 1993
Applicant:
Inventor:
Shin-ichi Ito, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430321 ;
Abstract
This invention provides an exposure mask having mask patterns formed on a transparent substrate, the mask patterns including translucent phase shift patterns having a light path length for exposure light differentiated by 180.degree. from that of transparent areas of said transparent substrate and transparent phase shift patterns. Such an exposure mask can be advantageously used to realize highly defined patterns.