The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1995
Filed:
Jun. 18, 1993
Robert W McElhanon, Bryans Road, MD (US);
Ganesh K Gopalakrishnan, Lorton, VA (US);
William K Burns, Alexandria, VA (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
A process for making thick metal structures on a substrate has the steps of: selectively exposing a thick layer of photoresist disposed on a substrate to ultraviolet radiation including the 350 nm to 450 nm portion of tile spectrum of a mercury vapor lamp, where the photoresist layer is a heat-treated arid hydrated photoresist layer, to fully pattern the substrate: developing the patterned substrate by contacting the photoresist layer with a photoresist developing solution; exposing the photoresist layer to a plasma for hardening the pattern against thermal flow; hardbaking the photoresist pattern on the substrate; plating the metal onto the patterned substrate using a low current density (J) during at least part of the plating process, making a thick methyl structure on the substrate.