The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1995
Filed:
May. 28, 1992
Applicant:
Inventor:
Deepak K Pai, Burnsville, MN (US);
Assignee:
Ceridian Corporation, Bloomington, MN (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430 22 ; 356401 ;
Abstract
An alignment mark system and method of using the same wherein each mask of a sequence of masks includes a mask sequence indicium, a first alignment feature and a second alignment feature spaced from the first alignment feature. Each of the mask sequence indicium, the first alignment feature and the second alignment feature produce a corresponding structure as a result of the photolithographic process. The structure resulting from the second alignment feature is aligned with the first alignment feature of the immediately succeeding mask for proper alignment of the mask sequence.