The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1995
Filed:
Oct. 04, 1993
Armin de Meijere, Seevetal, DE;
Hans-Rolf Dubal, Konigstein/Taunus, DE;
Claus Escher, Muhltal, DE;
Wolfgang Hemmerling, Sulzbach, DE;
Ingrid Muller, Hofheim am Taunus, DE;
Dieter Ohlendorf, Liederbach, DE;
Rainer Wingen, Hattersheim am Main, DE;
Takamasa Harada, Frankfurt am Main, DE;
Gerhard Illian, Frankfurt am Main, DE;
Mikio Murakami, Kakegawa, JP;
Hoechst Aktiengesellschaft, Frankfurt am Main, DE;
Abstract
Disclosed and claimed are liquid-crystalline cyclopropylalkyl or -alkenyl or heterocyclic compounds, process for their preparation, and their use in liquid-crystalline mixtures. The novel cyclopropylalkyl or -alkenyl or heterocyclic compounds are of the general formula ##STR1## In this formula A.sup.1, A.sup.2 and A.sup.3 are unsubstituted or substituted, aromatic or heteroaromatic molecular components such as 1,4-phenylene or pyrimidine-2,5-diyl which are linked via a single bond (in the case where k and m=0) or via functional groups M.sup.1 and M.sup.2, such as CO--O or CH.sub.2 --O; j, k, l, m and n are zero, 1 or 2. The radicals R.sup.2, R.sup.3 and R.sup.4 are H or alkyl/alkenyl, R.sup.1 is alkyl/alkenyl or one of the substitutents known from LC chemistry such as an .alpha.-haloalkanoic acid radical. At least one of the components A.sup.1, A.sup.2 and A.sup.3 can be heteroaromatic, and G is alkylene or alkenylene.