The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 1995
Filed:
Oct. 04, 1990
U.S. Philips Corporation, New York, NY (US);
Abstract
In a marking system a pattern of marks present in a mask (30) is transferred to the surface (51) of an object (50) by causing radiation to act on the surface (51) via a mask (30). By adapting the shape and the area of the cross-section of the radiation beam to the pattern to be shown, the pattern is irradiated at a high intensity while the amount of radiation falling outside the pattern is reduced. This is achieved by adapting the cross-section of the beam by means of an exchangeable optical guide and/or cylindrical lenses (21, 22) and/or by stepwise scanning the mask (30) in one or two directions by means of a scanning system (23, 24) while the irradiated parts (I.sub.1, . . . , I.sub.n) overlap each other to a considerable extent.