The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 1995

Filed:

May. 21, 1993
Applicant:
Inventors:

Yoshihito Hodosawa, Shizuoka, JP;

Hideo Nagano, Shizuoka, JP;

Hirokazu Saito, Shizuoka, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ; B01J / ;
U.S. Cl.
CPC ...
264-41 ; 252314 ; 264-47 ; 425-5 ;
Abstract

A method for manufacturing microcapsules which prevents capsule particles from adhering to the inner wall surfaces of a wall-film-forming reactor device, thereby to eliminate the possibility that qualities of the microcapsule, such as the heat resisting, solvent resisting and other properties thereof, are deteriorated, and to eliminate the need for an operation to clean substances adhered to the inner wall surfaces of the wall-film-forming reactor device, and therefore, which is able to manufacture microcapsules at a high production efficiency. An emulsified solution is injected into a wall-film-forming reactor device from the lower portion thereof by an emulsified solution feed pump. After completion of a given time of a wall-film-forming reaction in the wall-film-forming reactor device, the emulsified solution is discharged from an overflow outlet formed in the upper portion of the device, and is then cooled by a heat exchanger. A water vapor injection valve is opened at the same time when, or more preferably, before the emulsified solution is injected into the wall-film-forming reactor device, water vapor is blown into a space in the wall-film-forming reactor device to form water drops on the wall surfaces of the space in the wall-film-forming reactor device to cover the space wall surfaces with the drops.


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