The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 1995
Filed:
Aug. 04, 1993
Applicant:
Inventors:
Cheng-Kung Liu, Norwalk, CT (US);
John C Brewer, Bristol, CT (US);
Assignee:
United States Surgical Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L / ;
U.S. Cl.
CPC ...
606231 ; 26433119 ;
Abstract
A polyamide monofilament suture of reduced energy and/or increased knot security is prepared by extruding a monofilament from polyamide resin, stretching the monofilament and annealing the stretched monofilament.
Liu, Cheng-Kung. (1995). Polyamide monofilament suture (U.S. Patent No. 5405358). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5405358
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile