The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 1995
Filed:
Jan. 04, 1994
Arthur P D'Silva, Ames, IA (US);
Cetac Technologies Inc., Omaha, NE (US);
Abstract
A system and method for extending the limits of detection of plasma based sample analysis systems is disclosed. The preferred embodiment of the present invention system provides a reaction tube which is connected to both a furnace tube and a discharge tube. During use a nebulized sample is caused to pass through the furnace tube wherein its temperature is caused to become elevated. As well, a volatile atom containing, primarily molecular, gas is caused to flow through the discharge tube, while an energy providing electrical discharge occurs therein, such that dissociated volatile atoms are produced. The method of the present invention provides that typically elevated temperature nebulized sample, and the dissociated volatile atoms, be simultaneously entered into a reaction means wherein relatively easily dissociated molecules containing nebulized sample components are formed. The formed relatively easily dissociated molecules, being easier to dissociate than molecules present in the original nebulized sample, it should be appreciated effectively allow detection of nebulized sample components in a plasma based system utilizing the present invention, at lower concentration limits, compared to plasma analysis systems not utilizing the present invention.