The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 1995

Filed:

Apr. 30, 1993
Applicant:
Inventors:

Masami Watanabe, Sodegauramachi, JP;

Shuji Machida, Sodegauramachi, JP;

Satoshi Asahi, Sodegauramachi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526284 ; 526160 ; 526293 ; 526346 ; 526347 ;
Abstract

The present invention provides an aryl styrene-based polymer of a degree of polymerization of at least 5 having recurring units represented by the general formula ##STR1## in the formula, R.sup.1 to R.sup.5 each denote a hydrogen atom, halogen atom or substituent group containing at least either one kind of a carbon atom, oxygen atom, nitrogen atom, sulfur atom, phosphorus atom, selenium atom, silicon atom and tin atom and at least one of the R.sup.1 to R.sup.5 denotes an aryl group having a hydrogen atom, aryl group having a halogen atom or aryl group having a substituent group containing at least either one kind of a carbon atom, oxygen atom, nitrogen atom, sulfur atom, phosphorus atom, selenium atom, silicon atom and tin atom, of which the stereospecificity is a mainly syndiotactic configuration and a method for the preparation thereof as well as a styrene-based copolymer and a method for the preparation thereof. The aryl styrene-based copolymer of the-present invention has a high syndiotacticity and is excellent in the heat resistance, resistance against chemicals and electric properties. Further, the styrene-based copolymer of the present invention has a high syndiotacticity and, in addition, has a wide temperature range suitable for melt molding or is excellent in the heat resistance. Accordingly, the present invention can be effectively utilized as heat-resistant resins, base materials of films and the like.


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