The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 1995
Filed:
Jul. 24, 1991
Fumio Maruhashi, Hitachi, JP;
Nobuko Nishimura, Woodland Hills, CA (US);
Ryoichi Haga, Hitachi, JP;
Harumi Matsuzaki, Hitachi, JP;
Ryusei Nakano, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In order to investigate an object, such as a culture of micro-organisms, the object is repeatedly captured at two different magnifications by a suitable image pick-up device. The images at the two different magnifications are then analysed by a suitable picture image recognition device and the results of the repeated analysis are compared, thereby to derive a measurement of the change in the object with time. Thus, for a culture of micro-organisms, the number of cells can be determined at one magnification and the number of microscopic spherical bodies can be determined at another magnification, to obtain a measure of the activity of the culture. Preferably, one or more conditions of the object are then controlled on the basis of the measurement of change.