The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 1995
Filed:
Jan. 31, 1992
Applicant:
Inventors:
Takaaki Otagawa, Fremont, CA (US);
Marc J Madou, Palo Alto, CA (US);
Leonor A Wachsman, Palo Alto, CA (US);
Assignee:
Osaka Gas Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M / ;
U.S. Cl.
CPC ...
429213 ; 429237 ; 2042 / ; 204280 ; 204291 ; 2041921 ; 205122 ; 205317 ; 205188 ; 359265 ; 359266 ; 359268 ; 359273 ; 359274 ; 359275 ;
Abstract
The present invention relates to a method to produce a thin film three dimensional microelectrode of an electrically conductive polymer having an organized array of identical microprotrusions, which method comprises:
Otagawa, Takaaki. (1995). Photolithographic and electron beam lithographic fabrication of micron (U.S. Patent No. 5403680). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5403680
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile