The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 1995
Filed:
Apr. 05, 1994
Applicant:
Inventor:
Takushi Motoyama, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156660 ; 1566611 ; 1566591 ;
Abstract
A process for forming a pattern, which includes forming a first resist layer on an article to be fabricated, which article is formed over a substrate, forming a mask layer of Spin On Glass, for etching the first resist layer, on the first resist layer, patterning the mask layer, selectively etching the first resist layer by using the mask layer as a mask, removing the patterned mask layer, by an etching process, selectively etching the article to be fabricated by using the etched first resist layer as a mask, and removing the etched first resist layer to thus form a predetermined pattern.