The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 1995
Filed:
Oct. 25, 1993
Kaaeid A Lokhandwala, Menlo Park, CA (US);
Richard W Baker, Palo Alto, CA (US);
Lora G Toy, San Francisco, CA (US);
Karl D Amo, San Carlos, CA (US);
Membrane Technology and Research, Inc., Menlo Park, CA (US);
Abstract
Improved membranes and improved membrane processes for treating gas streams containing hydrogen sulfide and methane, plus water vapor, carbon dioxide or both. The processes rely on the availability of two membrane types, one of which has a high hydrogen sulfide/methane selectivity and a high water vapor/methane selectivity, when measured with multicomponent gas mixtures at high pressures. Based on the different permeation properties of the two membrane types, optimized separation processes can be designed. In favorable cases, the processes can simultaneously dehydrate the gas stream and remove the hydrogen sulfide to very low levels.