The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Nov. 17, 1992
Applicant:
Inventors:
Tian-I Liou, San Jose, CA (US);
Chih-Sieh Teng, San Jose, CA (US);
Assignee:
National Semiconductor Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 34 ; 437 44 ; 437 57 ; 437200 ; 437192 ;
Abstract
The present process comprises the use of a differential oxidation of the source/drain regions to permit elimination of the p+ implant mask normally required for formation of p-channel device in a CMOS process. A DDD procedure provides protection against hot-electron effects. A second oxide spacer is included to allow formation of salicide at the contacts to provide low sheet resistance.