The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Feb. 28, 1994
Monti E Aklufi, San Diego, CA (US);
Abstract
A method is provided for forming thin films, such as high temperature superconductors, on a surface of a substrate using pulsed microwaves to control substrate temperature. The method includes vaporizing a liquid source to form a series of vapor pulses, irradiating the vapor pulses and a makeup gas with pulsed microwaves, and exposing the surface of the substrate to the irradiated mixture to form a thin film on the surface. The microwaves may be pulsed to coincide with the arrival of the vapor pulses at the substrate, thus reducing the amount of material consumed and the amount of waste. Further, the plasma may be closely confined to the substrate with a dielectric waveguide to reduce the power required for irradiating the mixture and to prevent the formation of stray deposits on surfaces enclosing the substrate.