The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Dec. 08, 1992
Applicant:
Inventors:
Hiroshi Kikuchi, Zushi, JP;
Yasushi Sano, Yokohama, JP;
Satoru Todoroki, Yokohama, JP;
Hitoshi Oka, Yokohama, JP;
Toshiyuki Koshita, Mobara, JP;
Masato Kikuchi, Mobara, JP;
Mitsuo Nakatani, Mobara, JP;
Michio Tsukii, Mobara, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ; B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134 23 ; 252544 ; 252548 ;
Abstract
A resist is peeled without leaving a residue after peeling, by bringing a resist-peeling liquid comprising a primary aliphatic amine of 2-6 carbon atoms into contact with the surface of an etched novolak positive photoresist, and removing the resist-peeling liquid containing the thus peeled resist from the surface of the etched resist. The used resist-peeling liquid can easily be recovered and regenerated.