The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Jul. 13, 1992
Richard Weber, Prosper, TX (US);
Donald C Price, Dallas, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A thermal control system in which a boiling liquid refrigerant is vaporized by heat addition from the system electronics. The pressure on the boiling liquid refrigerant and the vaporized refrigerant thereover is maintained constant so that the temperature of vaporization is maintained constant. For this reason, the boiling liquid refrigerant rapidly vaporizes and concomitantly removes from the system the very large amount of heat required for the refrigerant to pass from the liquid to the gaseous phase. The heat transfer rates under these conditions are extremely high. In addition to heat addition to the liquid before vaporization, the mass of liquid vaporized absorbs heat during vaporization of the liquid. The transition from liquid to vapor occurs at a constant temperature which is controlled by controlling the pressure at which the vaporization takes place. The vaporization pressure is controlled by a back-pressure regulator and the liquid is supplied to the evaporator from a pressurized reservoir and is controlled by a pressure/flow regulator. The pressure in the pressurized reservoir is maintained at a higher level than the desired pressure within the evaporator so that fluid flow will always flow from reservoir to evaporator. The specific pressure within the evaporator is controlled within very narrow limits by the back-pressure regulator.