The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 1995
Filed:
Aug. 31, 1993
Applicant:
Inventors:
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430323 ;
Abstract
An exposure mask and an exposure method are provided, which can suppress adverse effects of interference edge patterns (sub-shifters) located around a central pattern. The exposure mask has central patterns and edge patterns arranged around each central pattern. The mutual interference of edge patterns is reduced by providing an angle or a phase difference between vicinity edge patterns, or providing a single edge pattern to reduce the light transmission.