The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 1995
Filed:
Jul. 02, 1993
Applicant:
Inventors:
Assignee:
Semiconductor Energy Laboratory Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B / ; C01B / ;
U.S. Cl.
CPC ...
423446 ; 427249 ; 4272551 ;
Abstract
A CVD method for forming a diamond or diamond containing carbon film comprises the step of inputting a reactive gas, supplying energy to the reactive gas, and depositing the carbon film on a substrate. The reactive gas includes a carbon compound material which has a diamond structure in its molecular structure. The representative material is adamantane. Oxygen or hydroxyl group is also added in order to improve the crystallinity of the deposited carbon film.