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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5396566 B1

PDFFull Text
Date of Patent:
Mar. 07, 1995

Filed:

Mar. 04, 1993

Estimation of baseline, line spacing and character height for

Applicant:
Inventors:

Wilker S Bruce, Boca Raton, FL (US);

Joonki Kim, White Plains, NY (US);

Donald B Matson, Boca Raton, FL (US);

William D Modlin, Boca Raton, FL (US);

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorneys:

Arnold; Jack M.

Tassinari, Jr.; Robert P.

Primary Examiner:

Yon J Couso

Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382 46 ; 382 13 ;
Abstract

A line space baseline adjuster in a handwriting recognition system achieves improved recognition accuracy by normalizing the Cartesian coordinates of the writings captured by a digitizer to coincide with prototype character space. The normalization techniques include weighted average estimation, prototype extraction estimation, extreme point clustering estimation and a combination of prototype extraction estimation and extreme point clustering estimation.

Find Patent Forward Citations

Bruce, Wilker. (1995). Estimation of baseline, line spacing and character height for (U.S. Patent No. 5396566). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5396566

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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