The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 1995
Filed:
Apr. 25, 1994
Satoshi Morita, Kanagawa, JP;
Hisatsugu Torii, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In a photosensitive material processing apparatus, a conveying rack is provided so as to be able to be immersed in and lifted out from both of first and second processing chambers simultaneously. The conveying rack includes a plurality of conveying roller pairs and conveys a photosensitive material from the first to the second processing chamber via a processing solution partitioning member while immersing it in the processing solutions. At least one of the plurality of conveying roller pairs which are provided in the first processing chamber is a one-way rotating conveying roller pair which is rotated only in a rotating direction corresponding to a direction of conveying the photosensitive material. When the conveying rack which is immersed in the first and second processing chambers is lifted out therefrom, levels of the processing solutions in the first and second processing chambers are changed equally. Even if the conveying rack is lifted with the photosensitive material therein, the photosensitive material is smoothly withdrawn and the processing solution partitioning member follows changes in a conveying path of the photosensitive material. Therefore, a function of separating the processing solutions does not deteriorate, and the processing solutions in the first and second processing chambers do not mix.