The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 1995

Filed:

Oct. 06, 1992
Applicant:
Inventors:

Johannes A Overweg, Eindhoven, NL;

Gerardus N Peeren, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V / ;
U.S. Cl.
CPC ...
335301 ; 335216 ; 335296 ; 335299 ; 324319 ;
Abstract

An extremely efficient magnet system having a comparatively large angle of aperture can be obtained for magnetic resonance imaging by a reduction of fields of all orders in a common approach affecting active and passive as well as positive and negative oriented coil elements. Passive soft-magnetic ring segments are arranged in two pairs and located within a plurality of larger diameter active magnetic coils. The active coils include a central coil and outer coils wherein the outer coils are smaller than the central coil. The coils are in a helium Dewar vessel and arranged such that the system has an aperture of about 90.degree.. The central active coil may have a larger radius than the smaller outer coils.


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