The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 1995
Filed:
Jul. 01, 1993
Applicant:
Inventors:
Yoichi Kyuko, Tsukuba, JP;
Shinji Ozawa, Tsukuba, JP;
Makoto Takagawa, Tsukuba, JP;
Kenji Inamasa, Tsukuba, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
585400 ; 585654 ; 585658 ; 585660 ;
Abstract
A process for producing dimethylnaphthalene by the dehydrogenation of dimethyl-tetrahydronaphthalene which comprises carrying out the dehydrogenation reaction in a gaseous state at a temperature of 200.degree. to 350.degree. C. in the presence of a diluting medium and by the use of a platinum and/or palladium catalyst supported on an activated carbon carrier. The process is capable of producing industrially useful dimethylnaphthalene with a high yield and a high selectivity and minimized side reactions, over a long stabilized period.