The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 1995
Filed:
Apr. 23, 1993
Peter G Tsantrizos, Ville St-Pierre, CA;
Serge Grenier, Montreal, CA;
Pegasus Refractory Materials, Inc., Montreal, CA;
Abstract
A process is disclosed to synthesize fullerenes in a plasma reactor. It comprises introducing various amounts of carbon halides as the plasma forming gas in a plasma torch capable of producing a high enough temperature flame to dissociate the carbon bearing molecules into carbon and halogen atoms, hence forming a carbon cloud which condenses into a soot containing fullerenes. Also hydrocarbons can be introduced in the torch as the plasma forming gas and reacted with carbon halides or halogens injected therewith or directly into the plasma flame at the exit of the torch. Moreover, an inert gas, such as helium, may also be used as the plasma forming gas. The process can use a high enthalpy non-transferred d.c. plasma torch or an induction plasma torch as the plasma generating device.